| 모델명 | VOYAGER |
| 제조사 | Raith |
| 용도 | 100nm 이하 미세패턴 소자 제작 |
| 이용수가(원) / 30분 기준 | |
ZEUS 클라우드 실시간 예약으로만 장비예약 가능 | |
| POSTECH(내부) 직접 | 60,000 |
| POSTECH(내부) 참여자 | 35,000 |
| POSTECH(내부) 서비스 | 125,000 |
| 외부 직접 | 85,000 |
| 외부 서비스 | 165,000 |
- 이용료 부과기준: 30분당/회
- PR 및 Developer 미제공
- 본 장비는 인프라고도화사업으로 구축한 장비입니다. 인프라고도화사업의 장비활용실적 증빙을 위해, ZEUS 클라우드 실시간예약으로만 장비예약이 가능합니다.
No. | Items | Description |
| 1 | VOYAGER key hardware features | - eWrite Technology - <10nm line width guaranteed (<8nm with optional 20-bit upgrade) - beam energy 50keV (optional further modes with lower kV) - electrostatic deflection (single stage => no subfields) - Tail free electrostatic beamblanking at the crossover point - Thermal field emission electron source technology - ~50pA to ~40nA beam current - flexible, adjustable beam current and reproducible presets, due to a 2x zoom condensor lens configuration - Secondary electron (SE) detector - shadow free BSE detector (optional) - writefield size: up to 500μm at 50kV (optional larger than 1mm at lower kV) - dynamic real-time error compensation (stigmator/focus/distortions) for fast, large area exposures - high speed pattern generator with 50MHz - flexible pattern generator firmware for improved upgradability - pattern generator resolution (DAC bits): 18-bit (optional 20-bit for ultra high resolution in large writefields) - temperature-stabilized shield for electron optics - laser-interferometer controlled stage with 150 x 150 mm travel range - stage controlled in closed loop, with DC-motors as main drives and shift piezos for fine positioning - 1 nm X-Y positioning resolution independent of working distance, writefield size and magnification - samples with 8 inch diameter or 7 inch square can be loaded (see options list for special holders) - optional exposure automation package ErgFlow mit new GUI for automatic exposure of multiple samples and an easy to use stand-alone Job Manager and Job Creator software for an easy inter-faculty data exchange - kinematic - stress free - sample holder mount with integrated leveling - dry vacuum system with automatic 8 inch load lock |
| 2 | VOYAGER key software features | - automatic system setup (writefield alignment/autofocus/autostigmator/autobrightness/autocontrast) - at least 2 optimized preconfigured exposure modes: e.g. throughput and high resolution - high software integration from data import, CAD editing, CAD optimizing (pre- and postprocessing) to the final exposure - system control software with multi-user management system - SEM inspection mode - basic metrology software (e.g. automized linewidth measurements over full samples) - pattern proximity effect correction and postprocessor - industry PC with Microsoft Windows operating system |
| 3 | Wafer size | 조각 ~ 6inch |
| 4 | Pr, Developer | 용액 미제공 |
No. | Items | Description |
| 1 | VOYAGER key hardware features | - eWrite Technology - <10nm line width guaranteed (<8nm with optional 20-bit upgrade) - beam energy 50keV (optional further modes with lower kV) - electrostatic deflection (single stage => no subfields) - Tail free electrostatic beamblanking at the crossover point - Thermal field emission electron source technology - ~50pA to ~40nA beam current - flexible, adjustable beam current and reproducible presets, due to a 2x zoom condensor lens configuration - Secondary electron (SE) detector - shadow free BSE detector (optional) - writefield size: up to 500μm at 50kV (optional larger than 1mm at lower kV) - dynamic real-time error compensation (stigmator/focus/distortions) for fast, large area exposures - high speed pattern generator with 50MHz - flexible pattern generator firmware for improved upgradability - pattern generator resolution (DAC bits): 18-bit (optional 20-bit for ultra high resolution in large writefields) - temperature-stabilized shield for electron optics - laser-interferometer controlled stage with 150 x 150 mm travel range - stage controlled in closed loop, with DC-motors as main drives and shift piezos for fine positioning - 1 nm X-Y positioning resolution independent of working distance, writefield size and magnification - samples with 8 inch diameter or 7 inch square can be loaded (see options list for special holders) - optional exposure automation package ErgFlow mit new GUI for automatic exposure of multiple samples and an easy to use stand-alone Job Manager and Job Creator software for an easy inter-faculty data exchange - kinematic - stress free - sample holder mount with integrated leveling - dry vacuum system with automatic 8 inch load lock |
| 2 | VOYAGER key software features | - automatic system setup (writefield alignment/autofocus/autostigmator/autobrightness/autocontrast) - at least 2 optimized preconfigured exposure modes: e.g. throughput and high resolution - high software integration from data import, CAD editing, CAD optimizing (pre- and postprocessing) to the final exposure - system control software with multi-user management system - SEM inspection mode - basic metrology software (e.g. automized linewidth measurements over full samples) - pattern proximity effect correction and postprocessor - industry PC with Microsoft Windows operating system |
| 3 | Wafer size | 조각 ~ 6inch |
| 4 | Pr, Developer | 용액 미제공 |
반도체기술융합센터, 포스텍
Center for Semiconductor Technology Convergence, POSTECH
Tel. 054-279-5024 | Fax. 054-279-5029 | cstcdesk@postech.ac.kr
37673 경상북도 포항시 남구 지곡로 127번길 80, 첨단기술사업화센터 4층
Fab2 #410, 80 Jigok-ro 127beon-gil, Nam-gu, Pohang, Gyeongsangbukdo, Republic of Korea